n1_4mer:GRV/n1_4mer:RV = (Global Relative Variance of OU patterns) / (Local Relative Variance of OU patterns)
n0_4mer:D = Distance between local and global OU patterns
n0_4mer:PS = Distance between 2 strands of same DNA molecule
Selected loci indicated by large D, increased GRV associated with decreased RV and moderate increase in PS
NC_007950: Polaromonas sp. JS666 plasmid 2, complete sequence
NCBI: NC_007950
Host Lineage: Polaromonas; Polaromonas; Comamonadaceae; Burkholderiales; Proteobacteria; Bacteria
General Information: This strain was isolated from sediment contaminated with cis-dichloroethane (cDCE), a common pollutant resulting from widespread manufacture and use of industrial solvents. This bacterium is the only known organism capable of using cDCE as a sole carbon and energy source. The ability of this strain to convert ethene to epoxyethane suggests that the first step in the cDCE biodegradation pathway is the oxidation of cDCE to an epoxide compound. Bacteria that are able to grow on cDCE are rare, and have only been found in very few highly selective artificial environments. The discovery of this bacteria may provide a low cost, self-sustaining bioremediation method in areas where cDCE is a problem contaminant.